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Acta Optica Sinica, Volume. 24, Issue 7, 869(2004)

The Developing Threshold Method for Precise Profile Control of Microlens Array with High Numerical Aperture

Dong Xiaochun and Du Chunlei
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    [4] [4] Dill F H, Hornberger W P, Hauge P S et al.. Characterization of positive photoresist. IEEE Trans. Electron. Devices, 1975, ED-22(7):445～452

    [6] [6] Zeng Hunjun, Chen Bo, Guo Lvrong et al.. Edge effect and its application in mask moving technique. Opto-Electronic Engineering, 2000, 27(5):19～22

    CLP Journals

    [1] [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], "Focal depth extending using rotational symmetric pupil masks," Chin. Opt. Lett. 5, 71 (2007)

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    Dong Xiaochun, Du Chunlei. The Developing Threshold Method for Precise Profile Control of Microlens Array with High Numerical Aperture[J]. Acta Optica Sinica, 2004, 24(7): 869

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    Paper Information

    Category: Physical Optics

    Received: Jan. 29, 2003

    Accepted: --

    Published Online: May. 25, 2010

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology