Laser & Optoelectronics Progress, Volume. 61, Issue 5, 0512005(2024)

Single-Beam Triaxial Atomic Magnetometer Based on Cross Bias Magnetic Field

Zinan Wu, Jialong Zhang, Mengyang He, Bokang Ren, Zilong Wang, Zhonghua Ou*, Huimin Yue**, Xiaojun Zhou, and Yong Liu
Author Affiliations
  • State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, Sichuan , China
  • show less
    Figures & Tables(5)
    Schematic diagram of the basic principle. (a) Operation process of atomic magnetometer; (b) atomic energy level of 87Rb (D2 line is not shown here)
    System structure (the heating light beam is not shown here)
    Measurement results of X-axis. (a) System response curve along X-axis, the insets are system response curve along Y-axis and Z-axis; (b) system sensitivity along X-axis, and the insert shows the bandwidth
    Measurement results of Y-axis. (a) System response curves of the magnetic field along Y-axis for different amplitudes of bias magnetic field applied in Z-axis; (b) relationship between bias magnetic field and conversion factor; (c) relationship between linewidth and bias magnetic field; (d) system sensitivity and system bandwidth
    Measurement results of Z-axis. (a) System response curves of the magnetic field along Z-axis for different amplitudes of bias magnetic field applied in Y-axis; (b) relationship between bias magnetic field and conversion factor; (c) relationship between linewidth and bias magnetic field; (d) system sensitivity and system bandwidth
    Tools

    Get Citation

    Copy Citation Text

    Zinan Wu, Jialong Zhang, Mengyang He, Bokang Ren, Zilong Wang, Zhonghua Ou, Huimin Yue, Xiaojun Zhou, Yong Liu. Single-Beam Triaxial Atomic Magnetometer Based on Cross Bias Magnetic Field[J]. Laser & Optoelectronics Progress, 2024, 61(5): 0512005

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Feb. 6, 2023

    Accepted: Apr. 10, 2023

    Published Online: Feb. 29, 2024

    The Author Email: Zhonghua Ou (ozh@uestc.edu.cn), Huimin Yue (yuehuimin@uestc.edu.cn)

    DOI:10.3788/LOP230592

    CSTR:32186.14.LOP230592

    Topics