Opto-Electronic Engineering, Volume. 31, Issue 1, 5(2004)
Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography[J]. Opto-Electronic Engineering, 2004, 31(1): 5
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