Laser & Optoelectronics Progress, Volume. 54, Issue 1, 13102(2017)

Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films

Xiao Heping*, Guo Guanjun, Ma Xiangzhu, and Zhang Shuangxiang
Author Affiliations
  • [in Chinese]
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    Xiao Heping, Guo Guanjun, Ma Xiangzhu, Zhang Shuangxiang. Influence of Thermal Annealing on Photoelectrical Properties of Indium-Tin Oxide Thin Films[J]. Laser & Optoelectronics Progress, 2017, 54(1): 13102

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Thin Films

    Received: Sep. 3, 2016

    Accepted: --

    Published Online: Jan. 17, 2017

    The Author Email: Xiao Heping (ietgu@163.com)

    DOI:10.3788/lop54.013102

    Topics