Chinese Journal of Lasers, Volume. 44, Issue 9, 903002(2017)

Preparation of Short and Medium Wave Infrared Anti-Reflective Coating Based on Chalcogenide Glass

Fu Xiuhua*, Jiang Hongyan, Zhang Jing, Xiong Shifu, Guo Kai, and Sun Bing
Author Affiliations
  • [in Chinese]
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    Figures & Tables(16)
    Refractive index of two materials. (a) ZnS; (b) YbF3
    Theoretical transmittance curves of anti-reflection coating
    Picture of coating stripping. (a) Single-layer ZnS; (b) single-layer YbF3
    Refractive index of M-11
    Unstripped coating samples
    Schematic of substrate curvature measurement
    Surfaces curvature of before and after coating tested by the step meter. (a) Before coating; (b) after coating
    Transmission spectrum of theoretical design
    Picture of coating thin film
    Transmittance curve of both sides in actual test. (a) 1.4~2.5 μm; (b) 3.5~4.5 μm
    Transmittance curve of both sides in actual test. (a) 1.4~2.5 μm; (b) 3.5~4.5 μm
    • Table 1. Technical parameters of anti-reflective coating

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      Table 1. Technical parameters of anti-reflective coating

      ParameterSpecification
      SubstrateTI-1173
      Incident angle /(°)0
      Spectrum range /nm1400-25003500-4500
      Transmittance /%>95>95
    • Table 2. Several groups of experiments

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      Table 2. Several groups of experiments

      HeatingAnnealingExperimental phenomenon
      NoNoCoating stripping
      YesNoCoating stripping
      NoYesCoating stripping
      YesYesCoating stripping
    • Table 3. Thermal and mechanical parameters of thin films

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      Table 3. Thermal and mechanical parameters of thin films

      MaterialThermal expansion /(10-6 K-1)Young's modulus /GPaThermal stress /(108 Pa)
      BaF218.4065-0.414
      YbF310.80762.667
      Al2O35.002302.507
      ZnS7.85745.208
      MgO10.50248.74-3.626
    • Table 4. Deposition process parameters of M-11, ZnS and YbF3

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      Table 4. Deposition process parameters of M-11, ZnS and YbF3

      MaterialSubstratetemperature /℃Filling gasDegree ofvacuum /PaDepositionrate /(nm·s-1)Ion source anodecurrent /AIon source anodevoltage /V
      M-11150O21.5×10-20.55180
      ZnS150Ar1.5×10-20.75180
      YbF3150Ar1.5×10-20.85180
    • Table 5. Residual deposition and its average value of the four experimental results

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      Table 5. Residual deposition and its average value of the four experimental results

      Number of layersResidual deposition
      Experiment 1Experiment 2Experiment 3Experiment 4Average value
      10.50.70.70.60.625
      20.40.50.50.50.475
      30.80.60.40.50.575
      40.60.70.40.40.525
      50.60.50.40.70.55
      60.60.50.60.50.55
      70.50.70.50.50.55
      80.60.50.60.60.575
      90.60.50.80.50.6
      100.50.80.50.50.575
      110.80.60.60.50.625
      120.50.50.50.60.525
      130.60.60.70.40.575
      140.60.60.50.50.55
      150.70.70.70.50.65
      160.60.60.50.50.55
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    Fu Xiuhua, Jiang Hongyan, Zhang Jing, Xiong Shifu, Guo Kai, Sun Bing. Preparation of Short and Medium Wave Infrared Anti-Reflective Coating Based on Chalcogenide Glass[J]. Chinese Journal of Lasers, 2017, 44(9): 903002

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    Paper Information

    Category: materials and thin films

    Received: May. 2, 2017

    Accepted: --

    Published Online: Sep. 7, 2017

    The Author Email: Xiuhua Fu (goptics@126.com)

    DOI:10.3788/CJL201744.0903002

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