[1] [1] M. Losurdo, M. M. Giangregorio, P. Capezzuto et al.. Structural and optical properties of nanocrystalline Er2O3 thin films deposited by a versatile low-pressure MOCVD approach [J]. J. Electrochem. Soc., 2008, 155(2): G44～G50

[2] [2] M. Losurdo, M. Bergmair, G. Bruno. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives [J]. J. Nanopart. Res., 2009, 11(7): 1521～1554

[3] [3] G. R. McIntyre, J. Kye, H. Levinson et al.. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations [J]. Microlith., Microfab. Microsyst., 2006, 5(3): 033001

[4] [4] S. B. Hatit, M. Foldyna, A. D. Martino et al.. Angle-resolved Mueller polarimeter using a microscope objective [J]. Phys. Stat. Sol. (A)., 2008, 205(4): 743～747

[5] [5] R. A. Chipman. Handbook of Optics [M]. New York: McGraw Hill, Inc., 1995

[6] [6] D. H. Goldstein. Mueller matrix dual-rotating retarder polarimeter [J]. Appl. Opt., 1992, 31(31): 6676～6683

[7] [7] R. W. Collins, J. Koh. Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films [J]. J. Opt. Soc. Am. A, 1999, 16(8): 1997～2006

[8] [8] I. J. Vaughn, B. G. Hoover. Noise reduction in a laser polarimeter based on discrete waveplate rotations [J]. Opt. Express, 2008, 16(3): 2091～2108

[9] [9] A. D. Martino, Y. K. Kim, E. Garcia-Caurel et al.. Optimized Mueller polarimeter with liquid crystals [J]. Opt. Lett., 2003, 28(8): 616～618

[10] [10] D. Goldstein. Polarized Light [M]. New York: Marcel Dekker, Inc., 2003

[11] [11] Aijun Zeng, Fanyue Li, Linglin Zhu et al.. Simultaneous measurement of retardance and fast axis angle of a quarter-wave plate using one photoelastic modulator [J]. Appl. Opt., 2011, 50(22): 4347～4352

[12] [12] Y. W. Liu, G. A. Jones, Y. Peng et al.. Generalized theory and application of Stokes parameter measurements made with a single photoelastic modulator [J]. Appl. Phys., 2006, 100(6): 063537

[13] [13] B. Wang, T. C. Oakberg. A new instrument for measuring both the magnitude and angle of low level linear birefringence [J]. Rev. Sci. Instrum., 1999, 70(10): 3847～3854

[14] [14] W. Guan, G. A. Jones, Y. W. Liu et al.. The measurement of the Stokes parameters: a generalized methodology using a dual photoelastic modulator system [J]. Appl. Phys., 2008, 49(14): 2644～2652

[15] [15] Y. Takakura, J. E. Ahmad. Noise distribution of Mueller matrices retrieved with active rotating polarimeters [J]. Appl. Opt., 2007, 46(30): 7354～7364

[16] [16] A. Ambirajan, D. C. Look. Optimum angles for a polarimeter: part 1 [J]. Opt. Eng., 1995, 34(6): 1651～1655

[17] [17] Yang Kun, Zeng Aijun, Wang Xiangzhao et al.. Fast axis calibration of quarter-wave plate by fundamental component extinction [J]. Chinese J. Lasers, 2007, 34(11): 1554～1556

[18] [18] Hu Jianming, Zeng Aijun, Wang Xiangzhao. Method to measure phase retardation of wave plate based on photoelastic modulation [J]. Acta Optica Sinica, 2006, 26(11): 1681～1686

[19] [19] Zeng Aijun, Wang Xiangzhao, Dong Zuoren et al.. Application of photoelastic modulator in modulation of polarization direction [J]. Chinese J. Lasers, 2005, 32(8): 1063～1067

[20] [20] Zeng Aijun, Wang Xiangzhao, Li Dailin et al.. A new method to calibrate accurately a photoelastic modulator [J]. Acta Optica Sinica, 2005, 25(6): 799～802

[21] [21] Baoliang Wang, T. C. Oakberg. A new instrument for measuring both the magnitude and angle of low level linear birefringence [J]. Rev. Sci. Instrum., 1999, 70(10): 3847～3854

[22] [22] Li Fanyue, Han Jie, Zeng Aijun et al.. Method for measuring retardation by swinging quarter-wave plate with phase modulator [J]. Chinese J. Lasers, 2011, 38(2): 0208003