Journal of Inorganic Materials, Volume. 38, Issue 4, 445(2023)

Dual-gate IGZO-based Neuromorphic Transistors with Stacked Al2O3/Chitosan Gate Dielectrics

Jingyu WANG1, Changjin WAN1, and Qing WAN1,2、*
Author Affiliations
  • 11. School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
  • 22. School of Micro-Nano Electronics, Zhejiang University, Hangzhou 310027, China
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    Figures & Tables(8)
    Schematic diagram of the IGZO-based neuromorphic transistor with different gate dielectrics
    Leakage current curves and corresponding AFM images (inset) of monolayer gate dielectric and bilayer gate dielectric
    Transfer characteristics and output characteristics of two kinds of dielectric devices
    (a) Top micrograph, (b) transfer characteristics with different VG2 (from-2.0 V to 1.0 V) and (c) the Vth with different VG2 of transistor
    (a) Schematic diagram of biological synapse and their equivalent electrical circuit of the neuromorphic transistor, (b) EPSC responses under an electric pulse of 0.5 V, and (c) EPSC induced by electric pulses of different amplitudes for IGZO-based dual-gate transistor with stacked Al2O3/chitosan gate dielectrics
    (a) Multi-pulse facilitation induced by eight successive electric pulse (0.5 V, 25 ms) and (b) ratio of A8/A1 plotted as a function of the time interval between the pulses for IGZO-based dual-gate transistor with stacked Al2O3/chitosan gate dielectrics
    • Table 1. Transistor parameters of IGZO-based transistors

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      Table 1. Transistor parameters of IGZO-based transistors

      Gate dielectricIoffIon/Ioff ratio Subthreshold swing/ (mV·decade-1) Hysteresis window/V Leakage current(VG=1.8 V)/nA μsat/(cm2·V-1·s-1)
      Chitosan2.92×10-91.06×10598.81.1066.418.0
      Chitosan/Al2O34.20×10-112.20×10678.33.731.320.9
    • Table 2. Energy consumption of the single EPSC peak in different artificial synaptic transistors

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      Table 2. Energy consumption of the single EPSC peak in different artificial synaptic transistors

      StructureVDS/V VG pulse EPSC/nAEnergy consumption/(pJ·spike-1) Ref.
      Nanogranular SiO2/IZO1.00.8 V, 20 ms5000105[33]
      GO+Chitosan/IGZO0.10.5 V, 20 ms1428[34]
      Carbon Nanotube (CNT)0.54.0 V, 1.0 ms157.5[35]
      Chitosan/IZO0.10.5 V, 25 ms2.66.5[36]
      Chitosan/IWO0.10.2 V, 20 ms4.79.4[37]
      Chitosan/IGZO0.10.5 V, 20 ms2652[38]
      Tungsten oxide0.30.6 V, 70 ms3.879[39]
      Chitosan/ IGZO0.10.5 V, 20 ms2448This work
      Chitosan/Al2O3/IGZO0.10.5 V, 20 ms0.861.7This work
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    Jingyu WANG, Changjin WAN, Qing WAN. Dual-gate IGZO-based Neuromorphic Transistors with Stacked Al2O3/Chitosan Gate Dielectrics [J]. Journal of Inorganic Materials, 2023, 38(4): 445

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    Paper Information

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    Received: Dec. 21, 2022

    Accepted: --

    Published Online: Oct. 17, 2023

    The Author Email: Qing WAN (wanqing@nju.edu.cn)

    DOI:10.15541/jim20220767

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