Journal of Synthetic Crystals, Volume. 50, Issue 2, 296(2021)

Effects of Substrate Heating Temperature and Post-Annealing Temperature on the Preparation of β-Ga2O3 Thin Films by Magnetron Sputtering

GAO Cancan1、*, JI Kaidi1, MA Kui1,2,3, and YANG Fashun1,2,3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • show less
    Figures & Tables(0)
    Tools

    Get Citation

    Copy Citation Text

    GAO Cancan, JI Kaidi, MA Kui, YANG Fashun. Effects of Substrate Heating Temperature and Post-Annealing Temperature on the Preparation of β-Ga2O3 Thin Films by Magnetron Sputtering[J]. Journal of Synthetic Crystals, 2021, 50(2): 296

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Dec. 14, 2020

    Accepted: --

    Published Online: Mar. 30, 2021

    The Author Email: Cancan GAO (403015906@qq.com)

    DOI:

    CSTR:32186.14.

    Topics