Two-sided integrated microstructure elements are increasingly used in the fields of integrated optical imaging and beam shaping. Aimed at resolving the difficulties of fabricating two-sided integrated microstructure elements with integral materials and high aspect ratio structures, a new method was proposed that was an improved ultraviolet imprint technology for fabricating two-sided integrated microstructure elements with high aspect ratios and without a film substrate. By applying this method, integrated light guide plate samples were successfully produced without film substrates and with high aspect ratios. The microstructures on the top and bottom surfaces of the samples were in agreement with the metal modules, within the margin of error, meaning that structural deformation was small in the imprint copying process. Moreover, the integrated light guide plate samples were unbending and of integrally even thickness. The experimental results show that the improved ultraviolet imprint technology can be used to fabricate two-sided integrated microstructure elements with high aspect ratios and without film substrates. This technique is applicable to the fabrication of optical elements with functionalities suitable for integrated optical imaging, beam shaping, light diffusion, light guiding, and light concentration.