Piezoelectrics & Acoustooptics, Volume. 46, Issue 4, 505(2024)

Study on the Double Mask Process for Preparation of E-Type Films

HAO Yiming1, LEI Cheng1, WANG Taolong1,2, YU Jiangang1, JI Pengfei1, YAN Shijin1, and LIANG Ting1
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  • 2[in Chinese]
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    References(4)

    [2] [2] LI C,CORDOVILLA F,OCANA J L.Annularly grooved mem-brane combined with rood beam piezoresistive pressure sensor for low pressure applications[J].Review of Scientific Instrument,2017,88:035002.

    [8] [8] TILLOCHER T,NOS J,ANTOUN G,et al.Comparison between Bosch and STiGer processes for deep silicon etching[J].Micromachines, 2021,12:1143.

    [9] [9] HONG Tijing, LIU Dengfeng, LIU Yi’an.Radar active jamming recognition based on multiscale fully convolutional neural network and GRU[J].Computer Science,2024,51(5):306-312.

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    HAO Yiming, LEI Cheng, WANG Taolong, YU Jiangang, JI Pengfei, YAN Shijin, LIANG Ting. Study on the Double Mask Process for Preparation of E-Type Films[J]. Piezoelectrics & Acoustooptics, 2024, 46(4): 505

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    Paper Information

    Received: Mar. 28, 2024

    Accepted: --

    Published Online: Sep. 18, 2024

    The Author Email:

    DOI:10.11977/j.issn.1004-2474.2024.04.015

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