Lithography Hotspot Detection Method Based on Pre-trained VGG11 Model

Lufeng Liao; Sikun Li; Xiangzhao Wang

doi:10.3788/AOS221429

Acta Optica Sinica, Volume. 43, Issue 3, 0312008(2023)

Lithography Hotspot Detection Method Based on Pre-trained VGG11 Model

Lufeng Liao^1,2, Sikun Li^1,2、*, and Xiangzhao Wang^1,2、**

¹Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

show less

Abstract Get PDF(in Chinese)

Cited By

Article index updated: Mar. 10, 2025

The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)

Tools

Get Citation

Copy Citation Text

Lufeng Liao, Sikun Li, Xiangzhao Wang. Lithography Hotspot Detection Method Based on Pre-trained VGG11 Model[J]. Acta Optica Sinica, 2023, 43(3): 0312008

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Jul. 6, 2022

Accepted: Aug. 31, 2022

Published Online: Feb. 13, 2023

The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)

DOI:10.3788/AOS221429

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology