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Chinese Journal of Lasers, Volume. 14, Issue 1, 24(1987)

Double exposure in electron holography

[in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, [in Chinese]1, and [in Chinese]2
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    References(4)

    [1] [1] D. Gabor; Nature(London), 1948, 161, 777.

    [2] [2] H. Wahl; Optik, 1974, 39, 585.

    [3] [3] A. Tonomura, T. Matsuda; Optik, 1979，53, 143.

    [4] [4] K. J. Hanszen; Electron Microsc. Proc. Bur. Congr. 7th, 1980, Vol. 1, 140.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Double exposure in electron holography[J]. Chinese Journal of Lasers, 1987, 14(1): 24

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    Paper Information

    Category: laser devices and laser physics

    Received: Apr. 14, 1986

    Accepted: --

    Published Online: Aug. 10, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology