Influence of purity of HfO2 on reflectance of ultraviolet multilayer

Jingmei Yuan; Hongji Qi; Yuan'an Zhao; Zhengxiu Fan; Jianda Shao

Chinese Optics Letters, Volume. 6, Issue 3, 03222(2008)

Jingmei Yuan, Hongji Qi, Yuan'an Zhao, Zhengxiu Fan, and Jianda Shao

R and D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800

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References(8)

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CLP Journals

[1] Chunrong Xue, Kui Yi, Chaoyang Wei, Jianda Shao, Zhengxiu Fan, "Optical constants of DUV/UV fluoride thin films," Chin. Opt. Lett. 7, 05449 (2009)

[2] He Junpeng, Zhang Yueguang, Shen Weidong, Liu Xu, Gu Peifu. Optical Properties of Al₂O₃ Thin Film Fabricated by Atomic Layer Deposition[J]. Acta Optica Sinica, 2010, 30(1): 277

[3] Yuan Jingmei, He Hongbo, Yi Kui, Shao Jianda, Fan Zhengxiu. Effect of Annealing on HfO₂/SiO₂, Y₂O₃/SiO₂ Multilayer Thin Films[J]. Chinese Journal of Lasers, 2009, 36(5): 1200

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Jingmei Yuan, Hongji Qi, Yuan'an Zhao, Zhengxiu Fan, Jianda Shao, "Influence of purity of HfO2 on reflectance of ultraviolet multilayer," Chin. Opt. Lett. 6, 03222 (2008)

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Paper Information

Received: Jun. 27, 2007

Accepted: --

Published Online: Mar. 27, 2008

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Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology