Integrated circuit（IC） lithography, as a typical representative of traditional lithography technology, supports the rapid development of integrated circuit chips. The new generation of photolithography technology has the advantages of diverse technology, high precision and high efficiency. It has great potential in the development of optoelectronic devices, the realization of 3-D micro-nano structure, and the construction of the ordered nanoscale channels. A variety of new photolithography technologies in recent years have been reviewed. Their characteristics and their applications in nanoelectronics, photonic devices, energy, sensing and other fields have been analyzed. Finally, the development direction of lithography technology in the future is prospected.