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Acta Optica Sinica, Volume. 33, Issue 10, 1034002(2013)

Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node

Du Yuchan1、*, Li Hailiang1, Shi Lina1, Li Chun2, and Xie Changqing1
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  • 1[in Chinese]
  • 2[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Du Yuchan, Li Hailiang, Shi Lina, Li Chun, Xie Changqing. Integrated Development of Extreme Ultraviolet Lithography Mask at 32 nm Node[J]. Acta Optica Sinica, 2013, 33(10): 1034002

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    Paper Information

    Category: X-Ray Optics

    Received: Apr. 16, 2013

    Accepted: --

    Published Online: Sep. 25, 2013

    The Author Email: Yuchan Du (dyc0927@163.com)

    DOI:10.3788/aos201333.1034002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology