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Acta Optica Sinica, Volume. 37, Issue 2, 222002(2017)

Experimental Research on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography

Chen Jinxin1,2、*, Wang Yu1, and Xie Wanlu1,2
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    Chen Jinxin, Wang Yu, Xie Wanlu. Experimental Research on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2017, 37(2): 222002

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Sep. 8, 2016

    Accepted: --

    Published Online: Feb. 13, 2017

    The Author Email: Jinxin Chen (ashion@aoe.ac.cn)

    DOI:10.3788/aos201737.0222002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology