[1] [1] Hong Yong Cheol, Cho Soon Chon, Uhm Han Sup. Applied Physics Letters, 2007, 90(14): 141501.

[2] [2] Kim Dan Bee, Rhee J K, Gweon B, et al. Applied Physics Letters, 2007, 91(15): 151502.

[3] [3] LI Shouahe, Huang Wentong, et al. Applied Physics Letters, 2009, 94(11): 111501.

[4] [4] Lim Jin-Pyo, Uhm Han S, Li Shouzhe. Phys. Plasmas, 2007, 14(9): 093504.

[5] [5] Kolb J F, Mohamed A.-A H. Price R O, et al. Applied Physics Letters, 2008, 92(24): 241501.

[7] [7] Hong Yong Cheol, Uhm Han Sup. Phys. Plasmas, 2007, 14(5): 053503.

[8] [8] Hong Yong Cheol, Cho Soon Cheon, et al. Phys. Plasmas, 2007, 14(7): 074502.

[9] [9] Zhang Xianhui, Li Maojin, Zhou Rouli, et al. Applied Physics Letters, 2008, 93(2): 021502.

[10] [10] Czernichowski A. J. Phys. D: Appl. Phys., 1987, 20: 559.

[11] [11] Lu Xinpei, Jiang Zhonghe, Xiong Qing, et al. Applied Physics Letters, 2008, 92(15): 151504.

[13] [13] Walsh J L, Kong M G. Applied Physics Letters, 2007, 91(22): 221502.

[14] [14] Moon Se Youn, Choe W. Spectrochimica Acta Part B, 2003, 58: 249.

[16] [16] Balcon N, Aanesland A, Boswell R. Plasma Sources Sci. Technol., 2007, 16: 217.

[17] [17] Laux C O, Spence T G, Kruger C H, et al. Plasma Sources Sci. Technol., 2003, 12: 125.

[19] [19] Griem Hans R. Plasma Spectroscopy. New York: MC Graw-Hill, 1964.

[21] [21] Forster S, Mohr C, Viol W. Surface & Coatings Technology, 2005, 200: 827.