Realization of 655 nm Micro-RCLED Working at Low Driving Current for Micro-Displays

Jianjun Li; Hongkang Cao; Jun Deng; Zhenyu Wen; Deshu Zou; Xiaoqian Zhou; Qiwei Yang

doi:10.3788/AOS202040.1526002

Acta Optica Sinica, Volume. 40, Issue 15, 1526002(2020)

Realization of 655 nm Micro-RCLED Working at Low Driving Current for Micro-Displays

Jianjun Li^*, Hongkang Cao, Jun Deng, Zhenyu Wen, Deshu Zou, Xiaoqian Zhou, and Qiwei Yang

Key Laboratory of Opto-Electronic Technology, Ministry of Education, Beijing University of Technology, Beijing 100124, China

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Jianjun Li, Hongkang Cao, Jun Deng, Zhenyu Wen, Deshu Zou, Xiaoqian Zhou, Qiwei Yang. Realization of 655 nm Micro-RCLED Working at Low Driving Current for Micro-Displays[J]. Acta Optica Sinica, 2020, 40(15): 1526002

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Paper Information

Category: Physical Optics

Received: Apr. 2, 2020

Accepted: May. 6, 2020

Published Online: Aug. 14, 2020

The Author Email: Li Jianjun (lijianjun@bjut.edu.cn)

DOI:10.3788/AOS202040.1526002

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