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Acta Optica Sinica, Volume. 35, Issue 3, 322005(2015)

Optical Design of High-Efficiency Ripple Plate Illuminator for EUV Lithography

Liang Xinli*, Li Yanqiu, and Mei Qiuli
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    Article index updated: Mar. 10, 2025

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    Liang Xinli, Li Yanqiu, Mei Qiuli. Optical Design of High-Efficiency Ripple Plate Illuminator for EUV Lithography[J]. Acta Optica Sinica, 2015, 35(3): 322005

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Sep. 22, 2014

    Accepted: --

    Published Online: Feb. 4, 2015

    The Author Email: Xinli Liang (bitliangxinli@163.com)

    DOI:10.3788/aos201535.0322005

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology