The study of SiH<sub>4</sub>N<sub>2</sub>gas discharge plasma with LIF

Acta Optica Sinica, Volume. 10, Issue 4, 316(1990)

The study of SiH₄N₂gas discharge plasma with LIF

[in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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[in Chinese], [in Chinese], [in Chinese]. The study of SiH₄N₂gas discharge plasma with LIF[J]. Acta Optica Sinica, 1990, 10(4): 316

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Category: Lasers and Laser Optics

Received: Jan. 16, 1989

Accepted: --

Published Online: Nov. 12, 2007

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