Polishing silicon modification layer on silicon carbide surface by ion beam figuring

Chinese Optics Letters, Volume. 12, Issue s2, S22206(2014)

Weijie Deng

Author Affiliations

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China

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References(5)

[1] [1] Y. Li, Yang, Advanced Optics Fabrication Technology (Science Press, Beijing, 2001)

[2] [2] M. Demmler, M. Zeuner, A. Luca, T. Dunger, D. Rost, S. Kiontke, and M. Krüger, Proc. SPIE 7934, 793416 (2011).

[3] [3] W. Liao, Y. Dai, X. Xie, L. Zhou, and Z. Yuan, Opt. Eng. 51, 033402 (2012).

[4] [4] Y. Dai, L. Zhou, X. Xie, C. Jiao, and S. Li, Acta Opt. Sin. 28, 1131 (2008).

[5] [5] M. A. Makeev, R. Cuerno, and A. L. Barabási, Nucl. Instrum. Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms 197, 185 (2002).

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Weijie Deng, "Polishing silicon modification layer on silicon carbide surface by ion beam figuring," Chin. Opt. Lett. 12, S22206 (2014)

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Paper Information

Category: Optical Design and Fabrication

Received: Mar. 13, 2014

Accepted: May. 3, 2014

Published Online: Sep. 5, 2014

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