Chinese Optics Letters, Volume. 11, Issue s1, S10206(2013)
Selective epitaxial growth of Ge nanodots with ultra-thin porous alumina membrane
[1] [1] S. Tong, F. Liu, A. Khitun, K. L. Wang, and J. L. Liu, J. Appl. Phys. 96, 773 (2004).
[2] [2] P. W. Li, W. M. Liao, David M. T. Kuo, S. W. Lin, P. S. Chen, S. C. Lu, and M. J. Tsai, Appl. Phys. Lett. 85, 1532 (2004).
[3] [3] J. S. Xia, K. Nemoto, Y. Ikegami, Y. Shiraki, and N. Usami, Appl. Phys. Lett. 91, 011104 (2007).
[4] [4] P.D. Tougaw, C. S. Lent, and W. Porod, J. Appl. Phys. 74, 3558 (1993).
[5] [5] B. E. Kane, Nature 393, 133 (1998).
[6] [6] G. Chen, G. Vastola, H. Lichtenberger, D. Pachinger, G. Bauer, W. Jantsch, F. Schaffler, and L. Miglio, Appl. Phys. Lett. 92, 113106 (2008).
[7] [7] A. Portavoce, M. Kammler, R. Hull, M. C. Reuter, and F. M. Ross, Nanotechnology 17, 4451 (2006).
[8] [8] D. Grutzmacher, T. Fromherz, C. Dais, J. Stangl, E. Muller, Y. Ekinci, H. H. Solak, H. Sigg, R. T. Lechner, E. Wintersberger, S. Birner, V. Holy, and G. Bauer, Nano Lett. 7, 3150 (2007).
[9] [9] Z. Y. Zhong, A. Halilovic, M. Muhiberger, F. Schaffler, and G. Bauer, Appl. Phys. Lett. 82, 445 (2003).
[10] [10] G. Q. Ding, M. J. Zheng, W. L. Xu, and W. Z. Shen, Nanotechnology 16, 1285 (2005).
[11] [11] E. Kasper, Properties of Strained and Relaxed Silicon Germanium (NDIP, Beijing, 2002).
[12] [12] Y. Lei and W. K. Chim, Chem. Mater. 17, 580 (2005).
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Wenbo Zhan, Yourui Huangfu, Xu Fang, Xia Hong, Liang Xia, Xiongbin Guo, Hui Ye, "Selective epitaxial growth of Ge nanodots with ultra-thin porous alumina membrane," Chin. Opt. Lett. 11, S10206 (2013)
Category: Deposition and process control
Received: Dec. 20, 2012
Accepted: Jan. 15, 2013
Published Online: May. 30, 2013
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