Dispersion Control and Beamline Design of Extreme Ultraviolet Attosecond Pulses

Siyuan Xu; Yuanfeng Li; Xiaoxian Zhu; Yitan Gao; Kun Zhao; Jiangfeng Zhu; Dacheng Zhang; Xinkui He; Hao Teng; Zhiyi Wei

doi:10.3788/CJL202148.0501009

Chinese Journal of Lasers, Volume. 48, Issue 5, 0501009(2021)

Dispersion Control and Beamline Design of Extreme Ultraviolet Attosecond Pulses

Siyuan Xu^1,2, Yuanfeng Li^1,2, Xiaoxian Zhu^2,3, Yitan Gao^2,3, Kun Zhao^2,4、*, Jiangfeng Zhu¹, Dacheng Zhang¹, Xinkui He^2,3,4, Hao Teng^2,4, and Zhiyi Wei^2,3,4、**

Author Affiliations

¹School of Physics and Optoelectronic Engineering, Xidian University, Xi'an, Shaanxi 710071, China

²Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

³University of Chinese Academy of Sciences, Beijing 100049, China

⁴Songshan Lake Material Laboratory, Dongguan, Guangdong 523808, China

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Siyuan Xu, Yuanfeng Li, Xiaoxian Zhu, Yitan Gao, Kun Zhao, Jiangfeng Zhu, Dacheng Zhang, Xinkui He, Hao Teng, Zhiyi Wei. Dispersion Control and Beamline Design of Extreme Ultraviolet Attosecond Pulses[J]. Chinese Journal of Lasers, 2021, 48(5): 0501009

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Paper Information

Category: laser devices and laser physics

Received: Dec. 17, 2020

Accepted: Feb. 5, 2021

Published Online: Mar. 12, 2021

The Author Email: Zhao Kun (zhaokun@iphy.ac.cn), Wei Zhiyi (zywei@iphy.ac.cn)

DOI:10.3788/CJL202148.0501009

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology