Journal of Synthetic Crystals, Volume. 51, Issue 9-10, 1745(2022)

Growth of 8 Inch Conductivity Type 4H-SiC Single Crystals

YANG Xianglong1,2、*, CHEN Xiufang1,2, XIE Xuejian1,2, PENG Yan1,2, YU Guojian2, HU Xiaobo1,2, WANG Yaohao2, and XU Xiangang1,2
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  • 1[in Chinese]
  • 2[in Chinese]
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    References(5)

    [1] [1] SIERGIEJ R R, CLARKE R C, SRIRAM S, et al. Advances in SiC materials and devices: an industrial point of view[J]. Materials Science and Engineering: B, 1999, 61/62: 9-17.

    [2] [2] CASADY J B, JOHNSON R W. Status of silicon carbide (SiC) as a wide-bandgap semiconductor for high-temperature applications: a review[J]. Solid-State Electronics, 1996, 39(10): 1409-1422.

    [4] [4] QUAST J, HANSEN D, LOBODA M, et al. High quality 150 mm 4H SiC wafers for power device production[J]. Materials Science Forum, 2015, 821/822/823: 56-59.

    [5] [5] MANNING I, ZHANG J, THOMAS B, et al. Large area 4H SiC products for power electronic devices[J]. Materials Science Forum, 2016, 858: 11-14.

    [6] [6] HU X B, XU X G, LI X X, et al. Stacking faults in SiC crystal grown by spontaneous nucleation sublimation method[J]. Journal of Crystal Growth, 2006, 292(2): 192-196.

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    YANG Xianglong, CHEN Xiufang, XIE Xuejian, PENG Yan, YU Guojian, HU Xiaobo, WANG Yaohao, XU Xiangang. Growth of 8 Inch Conductivity Type 4H-SiC Single Crystals[J]. Journal of Synthetic Crystals, 2022, 51(9-10): 1745

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    Paper Information

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    Received: Sep. 7, 2022

    Accepted: --

    Published Online: Nov. 18, 2022

    The Author Email: YANG Xianglong (yangxl2016@sdu.edu.cn)

    DOI:

    CSTR:32186.14.

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