Chinese Journal of Lasers, Volume. 29, Issue 1, 25(2002)

Comparison of Etching Characteristics of Polymers by 193 nm and 308 nm Excimer

[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    References(5)

    [1] [1] D. BAa¨Guerle. Laser Processing and Chemistry [M]. Springer, 1996

    [2] [2] J. H. Brannon, J. R. Lankard, A. I. Baise et al.. Excimer laser etching of polyimide [J]. J. Appl. Phys., 1985, 58(5):2036~2043

    [3] [3] R. Srinivasan, B. Braren, R. W. Dreyfus et al.. Mechanism of the ultraviolet laser ablation of polymethgl methacrylate at 193 and 248 nm:laser-induced fluorescence analysis, chemical analysis, and doping studies [J]. J. Opt. Soc. Am. B, 1986, 3(5):785~791

    [4] [4] Sylvain Lazare, Vincent Granier. Ultraviolet laser photoablation of polymers: A review and recent results [J]. Laser Chem., 1989, 10:25~40

    [5] [5] Th. Kunz, J. Stebani, J. Ihlemann et al.. Photoablation and microstructuring of polyestercarbonates and their blends with a XeCl excimer laser [J]. Appl. Phys. A, 1998, 67(3):347~352

    CLP Journals

    [1] Liu Ying, Jiang Yijian. Rapid Fabrication of Conducting Ploy (Vinylidene Fluoride) Surfaces Using a 248 nm Excimer Laser[J]. Chinese Journal of Lasers, 2011, 38(4): 406002

    [2] [in Chinese]. Interaction Between Excimer Laser and SiC Ceramic[J]. Laser & Optoelectronics Progress, 2016, 53(12): 121403

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Comparison of Etching Characteristics of Polymers by 193 nm and 308 nm Excimer[J]. Chinese Journal of Lasers, 2002, 29(1): 25

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    Paper Information

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    Received: Jul. 20, 2000

    Accepted: --

    Published Online: Aug. 8, 2006

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