International Journal of Extreme Manufacturing, Volume. 2, Issue 2, 22002(2020)
Atomic level deposition to extend Moore’s law and beyond
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Rong Chen, Yi-Cheng Li, Jia-Ming Cai, Kun Cao, Han-Bo-Ram Lee. Atomic level deposition to extend Moore’s law and beyond[J]. International Journal of Extreme Manufacturing, 2020, 2(2): 22002
Category: Topical Review
Received: Jan. 31, 2020
Accepted: --
Published Online: Jan. 28, 2021
The Author Email: Rong Chen (rongchen@mail.hust.edu.cn)