International Journal of Extreme Manufacturing, Volume. 2, Issue 2, 22002(2020)

Atomic level deposition to extend Moore’s law and beyond

Rong Chen1、*, Yi-Cheng Li1, Jia-Ming Cai1, Kun Cao1, and Han-Bo-Ram Lee2
Author Affiliations
  • 1State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan, Hubei, People’s Republic of China
  • 2Department of Materials Science and Engineering, Incheon National University, Incheon 22012, Republic of Korea
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    Rong Chen, Yi-Cheng Li, Jia-Ming Cai, Kun Cao, Han-Bo-Ram Lee. Atomic level deposition to extend Moore’s law and beyond[J]. International Journal of Extreme Manufacturing, 2020, 2(2): 22002

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    Paper Information

    Category: Topical Review

    Received: Jan. 31, 2020

    Accepted: --

    Published Online: Jan. 28, 2021

    The Author Email: Rong Chen (rongchen@mail.hust.edu.cn)

    DOI:10.1088/2631-7990/ab83e0

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