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Opto-Electronic Engineering, Volume. 31, Issue 3, 8(2004)

Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference

[in Chinese]1,2, [in Chinese]1, and [in Chinese]2
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    [1] [1] SPALLAS J P,HAWRYLUK A M, KANIA D R. Field emitter array mask patterning using laser interference lithography[J].J.Vac.Sci.Technol. B,1995,13(5):1973-1978.

    [2] [2] ZAIDI S H,BRUECK S R J.Interferometric lithography for nanoscale fabrication[J].SPIE,1999,3618: 2-8.

    [3] [3] FERNANDEZ A,NGUYEN H T,BRITrEN J A,et al.Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays[J]. J.Vac.Sci. Technol.B,1997,15(3):729-735.

    [4] [4] COWAN J J.The recording and large scale replication of crossed holographic grating arrays using multiple beam interferometry[J].SPIE,1984,503:120-129.

    [5] [5] DANIEL S C,CURTIS W P.Small field-of-view star identification using Bayesian decision theory [J].IEEE Transactions on Aerospace and Electronic system,2000,36(3):773-783.

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    [in Chinese], [in Chinese], [in Chinese]. Long focal depth photolithography for obtaining nanometer array patterns with multi-beam interference[J]. Opto-Electronic Engineering, 2004, 31(3): 8

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    Paper Information

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    Received: Dec. 2, 2003

    Accepted: --

    Published Online: Nov. 14, 2007

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology