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Opto-Electronic Engineering, Volume. 31, Issue 2, 8(2004)

Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography

[in Chinese]1, [in Chinese]1,2, and [in Chinese]2
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  • 2[in Chinese]
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    [3] [3] Zaidi S H,Brueck S R J.Multiple exposure interferometric lithography[J].SPIE,2197:869-875.

    [4] [4] Solak H H,David C,Gobrecht J,et al.Four-wave EUV interference lithography[J].Microelectronic Engineering.2002,61-62:77-82.

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    [in Chinese], [in Chinese], [in Chinese]. Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography[J]. Opto-Electronic Engineering, 2004, 31(2): 8

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    Paper Information

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    Received: Nov. 12, 2003

    Accepted: --

    Published Online: Nov. 14, 2007

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology