Analysis on the Diffracted Light Field by Phase Mask for Mid-infrared FBGs Inscription

LI Xue; GAO Weiqing; XU Qiang; HU Jigang; LI Yuan; ZHANG Wei; CHEN Xiangdong; YUAN Zijun; YU Youlong

doi:10.3969/j.issn.1003-501x.2016.12.003

Opto-Electronic Engineering, Volume. 43, Issue 12, 13(2016)

Analysis on the Diffracted Light Field by Phase Mask for Mid-infrared FBGs Inscription

LI Xue^1,2、*, GAO Weiqing³, XU Qiang⁴, HU Jigang⁴, LI Yuan⁴, ZHANG Wei⁴, CHEN Xiangdong⁴, YUAN Zijun⁴, and YU Youlong^1,5

Author Affiliations

¹School of Electronic Science and Applied Physics

²School of Instrument Science and Opto-electronics,Hefei University of Technology,Hefei 230009,China

³School of Electronic Science and Applied Physics,Hefei 230009,China

⁴School of Electronic Science and Applied Physics,Hefei 230009,China

⁵School of Instrument Science and Opto-electronics,Hefei University of Technology,Hefei 230009,China:

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LI Xue, GAO Weiqing, XU Qiang, HU Jigang, LI Yuan, ZHANG Wei, CHEN Xiangdong, YUAN Zijun, YU Youlong. Analysis on the Diffracted Light Field by Phase Mask for Mid-infrared FBGs Inscription[J]. Opto-Electronic Engineering, 2016, 43(12): 13

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Paper Information

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Received: Apr. 12, 2016

Accepted: --

Published Online: Dec. 30, 2016

The Author Email: Xue LI (18326677316@163.com)

DOI:10.3969/j.issn.1003-501x.2016.12.003

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology