Chinese Optics Letters, Volume. 8, Issue s1, 53(2010)
Atomic layer deposition for industrial optical coatings
[1] [1] T. Suntola and J. Antson, U. S. Patent 4,058,430, (November 15, 1977).
[2] [2] Planar Systems, Inc., www.planarembedded.com/technology/el/
[3] [3] J. Maula, K. Harkonen, and A. Nikolov, ”Multilayer material and method of preparing same” EP1674890 (2006).
[4] [4] J. Maula and K. Harkonen, “Method in depositing metal oxide materials” PCT Pub. No. WO/2009/004117 (2009).
[5] [5] D. Hausmann, J. Becker, S. Wang, and R. Gordon, Science, 298, 402 (2002).
[6] [6] J. J. Wang, X. Deng, R. Varghese, A. Nikolov, P. Sciortino, F. Liu, and L. Chen, Opt. Lett. 30, 1864 (2005).
[7] [7] D. P. Gaillot, “Optical Properties of Complex Periodic Media Structurally Modified by Atomic Layer Deposition”, PhD. Thesis (Georgia Institute of Technology, 2007)
[8] [8] J. Skarp, “Combination film, in particular for thin film electroluminescent structures” U. S. Patent 4,486,487, (1984).
[9] [9] Beneq Oy, http://www.beneq.com.
[10] [10] S. Sneck, P. Soininen, M. Putkonen, and L. Norin, in Proceedings of AVS 6th International Conference on ALD (2006).
[11] [11] M. Putkonen, P. Soininen, M. Rajala, and T. Mantyla, in Proceedings of AVS 55th International Symposium & Exhibition TueA-10 (2008).
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Jarmo Maula, "Atomic layer deposition for industrial optical coatings," Chin. Opt. Lett. 8, 53 (2010)
Received: Oct. 31, 2009
Accepted: --
Published Online: May. 14, 2010
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