OPTICS & OPTOELECTRONIC TECHNOLOGY, Volume. 21, Issue 1, 94(2023)

Analysis and Simulation of Laser-Induced Thermal Damage of Ta2O5/SiO2 Thin Film

QI Wen-yan and SU Jun-hong
Author Affiliations
  • [in Chinese]
  • show less
    References(4)

    [3] [3] K Mikami, S Motokoshi, T Somekawa, et al. Theoretical analysis for temperature dependence of laser- induced damage threshold of optical thin films[J]. Journal of Physics: Conference Series, 2016, 688(1): 10-15.

    [4] [4] S Jena, R B Tokas, S Tripathi, et al. Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films[J]. Journal of Alloys and Compounds, 2018, (3): 3-9.

    [11] [11] Mansuripur M, Connell G A, Goodman J W. Laser-induced local heating of multilayers[J]. Applied optics, 1982, 21(6): 55-59.

    Tools

    Get Citation

    Copy Citation Text

    QI Wen-yan, SU Jun-hong. Analysis and Simulation of Laser-Induced Thermal Damage of Ta2O5/SiO2 Thin Film[J]. OPTICS & OPTOELECTRONIC TECHNOLOGY, 2023, 21(1): 94

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Jul. 29, 2022

    Accepted: --

    Published Online: Mar. 22, 2023

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics