INFRARED, Volume. 44, Issue 2, 18(2023)

Study on Dislocation Suppression of Si-based CdTe Materials by In-situ Annealing

Zhen LI*, Dan WANG, Da GAO, and Wei-rong XING
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    References(5)

    [1] [1] Gravrand O, Destefanis G, Bisotto S, et al. Issues in HgCdTe Research and Expected Progress in Infrared Detector Fabrication [J]. Journal of Electronic Materials, 2013, 42(11): 3349-3358.

    [2] [2] Reddy M, Peterson J M, Vang T, et al. Molecular Beam Epitaxy Growth of HgCdTe on Large-Area Si and CdZnTe Substrates [J]. Journal of Electronic Materials, 2011, 40(8): 1706-1716.

    [5] [5] Yamaguchi M, Yamamoto A, Tachikawa M, et al. Defect Reduction Effects in GaAs on Si Substrates by Thermal Annealing [J]. Applied Physics Letters, 1998, 53(23): 4518-4522.

    [6] [6] Farrell S, Brill G, Chen Y, et al. Ex Situ Thermal Cycle Annealing of Molecular Beam Epitaxy Grown HgCdTe/Si Layers [J]. Journal of Electronic Materials, 2010, 39(1): 43-48.

    [8] [8] Wijewarnasuriya P S. Dislocation Reduction in HgCdTe Grown on CdTe/Si [C]. SPIE, 2016, 9854: 98540B.

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    LI Zhen, WANG Dan, GAO Da, XING Wei-rong. Study on Dislocation Suppression of Si-based CdTe Materials by In-situ Annealing[J]. INFRARED, 2023, 44(2): 18

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    Paper Information

    Received: Sep. 5, 2022

    Accepted: --

    Published Online: Mar. 17, 2023

    The Author Email: LI Zhen (liyuif@outlook.com)

    DOI:10.3969/j.issn.1672-8785.2023.02.004

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