Acta Optica Sinica, Volume. 37, Issue 5, 505001(2017)
Fast Simulation Method of Extreme-Ultraviolet Lithography 3D Mask Based on Variable Separation Degration Method
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Zhang Heng, Li Sikun, Wang Xiangzhao. Fast Simulation Method of Extreme-Ultraviolet Lithography 3D Mask Based on Variable Separation Degration Method[J]. Acta Optica Sinica, 2017, 37(5): 505001
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Category: Diffraction and Gratings
Received: Nov. 30, 2016
Accepted: --
Published Online: May. 5, 2017
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