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Chinese Journal of Lasers, Volume. 11, Issue 7, 393(1984)

XeCl excimer laser using liquid as chlorine donor

Zhang Dake, Zhang Zhengxian, Fu Shufen, and Chen Jianwen
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    References(3)

    [1] [1] J. J. Ewing et al., Appl. Phys. Lett., 1975, 27 355.

    [2] [2] E. Burnham; Opt. Commrn., 1978, 24, 161.

    [3] [3] R. Balimbcni et al.; Opt. Commun., 1981, 39, 75

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    Zhang Dake, Zhang Zhengxian, Fu Shufen, Chen Jianwen. XeCl excimer laser using liquid as chlorine donor[J]. Chinese Journal of Lasers, 1984, 11(7): 393

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    Paper Information

    Category: laser devices and laser physics

    Received: Aug. 12, 1983

    Accepted: --

    Published Online: Sep. 4, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology