Chinese Optics Letters, Volume. 3, Issue 7, 07428(2005)

Effects of oxygen partial pressure on optical absorption edge and UV emission energy of ZnO films

Ruijin Hong1,2, Jianda Shao1, Hongbo He1, and Zhengxiu Fan1
Author Affiliations
  • 1Research and Development Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
  • 2Graduate School of the Chinese Academy of Sciences, Beijing 100864
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    [3] [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Structure and Optical properties of ZnO Films DC Reactively Sputtered at Different Oxygen Partial Pressure[J]. Acta Optica Sinica, 2007, 27(4): 739

    [4] [in Chinese], [in Chinese], [in Chinese], "Effects of oxygen partial pressure on optical properties of NiOx films deposited by reactive DC-magnetron sputtering," Chin. Opt. Lett. 4, 678 (2006)

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    Ruijin Hong, Jianda Shao, Hongbo He, Zhengxiu Fan, "Effects of oxygen partial pressure on optical absorption edge and UV emission energy of ZnO films," Chin. Opt. Lett. 3, 07428 (2005)

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    Paper Information

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    Received: Sep. 15, 2004

    Accepted: --

    Published Online: Jun. 6, 2006

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