Chinese Optics Letters, Volume. 12, Issue s2, S22201(2014)

Study on the material-remove mechanism of SiC surface polishing

Fan Di1,2
Author Affiliations
  • 1Key Laboratory of Optical System Advanced Manufacturing Technology, Chinese Academy of Sciences, Changchun 130033, China
  • 2Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
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    [7] [7] Z. X. Liu, Ceram. Grinding 1, 36 (1998).

    [8] [8] D. Fan, Z. Y. Zhang, and H. Y. Niu, Opt. Tech. 30, 6 (2004).

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    [11] [11] L. Rich and D. A. Crowe, Proc. SPIE 2543, 236 (1995).

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    Fan Di, "Study on the material-remove mechanism of SiC surface polishing," Chin. Opt. Lett. 12, S22201 (2014)

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Dec. 7, 2013

    Accepted: Mar. 15, 2014

    Published Online: Nov. 12, 2014

    The Author Email:

    DOI:10.3788/col201412.s22201

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