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Chinese Journal of Lasers, Volume. 43, Issue 12, 1205001(2016)

Beam Alignment and Convergence Analysis of Scanning Beam Interference Lithography Systems

Wang Wei1,2、*, Bayanheshig1, Song Ying1, Jiang Shan1, and Pan Mingzhong1
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    Article index updated: Mar. 10, 2025

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    Wang Wei, Bayanheshig, Song Ying, Jiang Shan, Pan Mingzhong. Beam Alignment and Convergence Analysis of Scanning Beam Interference Lithography Systems[J]. Chinese Journal of Lasers, 2016, 43(12): 1205001

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    Paper Information

    Category: beam transmission and control

    Received: Aug. 16, 2016

    Accepted: --

    Published Online: Dec. 9, 2016

    The Author Email: Wei Wang (wayne_lzu@163.com)

    DOI:10.3788/cjl201643.1205001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology