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INFRARED, Volume. 44, Issue 3, 1(2023)

Study on Mesa Etching Technology for Type-II Superlattice Materials with Low Damage and High Aspect Ratio

Jing-feng LI*, Ming LIU, Hai-yan LI, Tao WEN, Cheng-cheng ZHAO, and Dan WANG
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    [4] [4] Reibel Y, Chabuel F, Vaz C, et al. Infrared Dual Band Detectors for Next Generation ［C］. SPIE, 2011, 8012: 801238.

    [5] [5] Mcewen R K, Hipwood L, Bains S, et al. Dual Waveband Infrared Detectors Using MOVPE Grown MCT ［C］. SPIE, 2019, 11002: 1100218.

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    LI Jing-feng, LIU Ming, LI Hai-yan, WEN Tao, ZHAO Cheng-cheng, WANG Dan. Study on Mesa Etching Technology for Type-II Superlattice Materials with Low Damage and High Aspect Ratio[J]. INFRARED, 2023, 44(3): 1

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    Received: Nov. 7, 2022

    Accepted: --

    Published Online: Apr. 7, 2023

    The Author Email: Jing-feng LI (ljf_0902@163.com)

    DOI:10.3969/j.issn.1672-8785.2023.03.001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology