PhotoniX, Volume. 4, Issue 1, 18(2023)

Realization of high aspect ratio metalenses by facile nanoimprint lithography using water-soluble stamps

Hojung Choi1、†, Joohoon Kim2、†, Wonjoong Kim1, Junhwa Seong2, Chanwoong Park1, Minseok Choi2, Nakhyun Kim1, Jisung Ha1, Cheng-Wei Qiu3, Junsuk Rho2,4,5,6、*, and Heon Lee1,7、**
Author Affiliations
  • 1Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea
  • 2Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
  • 3Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
  • 4Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
  • 5POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang, 37673, Republic of Korea
  • 6National Institute of Nanomaterials Technology (NINT), Pohang, 37673, Republic of Korea
  • 7ZERC, Seoul, 02841, Republic of Korea
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    Hojung Choi, Joohoon Kim, Wonjoong Kim, Junhwa Seong, Chanwoong Park, Minseok Choi, Nakhyun Kim, Jisung Ha, Cheng-Wei Qiu, Junsuk Rho, Heon Lee. Realization of high aspect ratio metalenses by facile nanoimprint lithography using water-soluble stamps[J]. PhotoniX, 2023, 4(1): 18

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    Paper Information

    Category: Research Articles

    Received: Dec. 5, 2022

    Accepted: May. 30, 2023

    Published Online: Jul. 10, 2023

    The Author Email: Junsuk Rho (jsrho@postech.ac.kr), Heon Lee (heonlee@korea.ac.kr)

    DOI:10.1186/s43074-023-00096-2

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