[1] de Boeij W P, Pieternella R, Bouchoms I et al. Extending immersion lithography down to 1x nm production nodes[J]. Proceedings of SPIE, 8683, 86831L(2013).

[3] Hidaka Y, Uchikawa K, Smith D G. Error analysis and compensation method of focus detection in exposure apparatus[J]. Journal of the Optical Society of America A, 26, 10-18(2008).

[4] Smith D G. Wafer thin film effects in lithographic focus detection[J]. Proceedings of SPIE, 8550, 85503L(2012).

[5] Sun Y W, Li S G, Ye T C et al. Process dependency of focusing and leveling measurement system in nanoscale lithography[J]. Acta Optica Sinica, 36, 0812001(2016).

[6] Sun S S, Wang D, Qi Y J et al. Design of reflective projection optics used in lithographic focusing and leveling system[J]. Acta Optica Sinica, 40, 1522002(2020).

[7] Sun Y W, Li S G, Zong M C. Nanoscale focusing and leveling measurement technology based on optical spatial split[J]. Acta Optica Sinica, 36, 0512002(2016).

[8] Duan C. The investigation of lithographic focus control technology[D]. Beijing: The University of Chinese Academy of Sciences, 64-70(2018).