Chinese Journal of Quantum Electronics, Volume. 29, Issue 6, 764(2012)

Alignment technology using matched filter correlation in projection lithography

Liang LEI*, Lang-lin LI, Jin-yun ZHOU, and Qu WANG
Author Affiliations
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    [1] [1] Lin K, Jain K. Design and fabrication of stretchable multilayer self-aligned interconnects for flexible electronics and large-area sensor arrays using excimer laser photoablation [J]. IEEE Electron Device Letters, 2009, 30(1): 14-17.

    [2] [2] Zimmermann M, Lindlein N, Voelkel R, et al. Microlens laser beam homogenizer: from theory to application [C]. Proc. of SPIE, 2007, 6663(1): 1-13.

    [4] [4] Katagiri S, Moriyama S, Terasawa T, et al. Novel alignment technique for 0.1-micron lithography using the wafer rear surface and canceling tilt effect [J]. Optical Engineering, 2004, 32(10): 2344-2349.

    [7] [7] Horner J L, Gianino P D. Phase-only matched filtering [J]. Applied Optics, 1984, 23(16): 812-816.

    CLP Journals

    [1] LIU Ziqiang, LEI Liang, LIU Xin, WANG Qi, YAN Runming, ZHOU Jinyun. Affine Transformation Optimal Matching Parameter Calculation Formula of Real-time Overlay Alignment[J]. Opto-Electronic Engineering, 2016, 43(4): 61


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    LEI Liang, LI Lang-lin, ZHOU Jin-yun, WANG Qu. Alignment technology using matched filter correlation in projection lithography[J]. Chinese Journal of Quantum Electronics, 2012, 29(6): 764

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    Paper Information


    Received: Feb. 7, 2012

    Accepted: --

    Published Online: Nov. 29, 2012

    The Author Email: Liang LEI (