Chinese Optics Letters, Volume. 13, Issue 2, 021301(2015)
Study of selectively buried ion-exchange glass waveguides using backside masking
Fig. 2. Process flow for the realization of SBWs. (a) The mask deposition, photolithography process, and chemical etching and backside mask deposition. (b) The thermal
Fig. 3. (a) Buried depth. (b) The output cross-section view of the waveguides.
Fig. 5. The measured
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Chongyang Pei, Gencheng Wang, Bing Yang, Longzhi Yang, Yinlei Hao, Xiaoqing Jiang, Jianyi Yang, "Study of selectively buried ion-exchange glass waveguides using backside masking," Chin. Opt. Lett. 13, 021301 (2015)
Category: Integrated Optics
Received: Sep. 15, 2014
Accepted: Nov. 14, 2014
Published Online: Sep. 25, 2018
The Author Email: Jianyi Yang (yangjy@zju.edu.cn)