Infrared Technology, Volume. 47, Issue 6, 696(2025)

Design of Micron Scale Digital Lithography Miniature Projection Objective

Jiagen YANG, Bokai HAO, Linfeng WAN, Shuangbao WANG, Zhimou XU, and Xueming ZHANG*
Author Affiliations
  • School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China
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    References(1)

    [14] [14] ZHENG L, Birr T, Zywietz U, et al. Feature size below 100 nm realized by UV-LED-based microscope projection photolithography[J].Light:Advanced Manufacturing, 2023,4(4): 410-419.

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    YANG Jiagen, HAO Bokai, WAN Linfeng, WANG Shuangbao, XU Zhimou, ZHANG Xueming. Design of Micron Scale Digital Lithography Miniature Projection Objective[J]. Infrared Technology, 2025, 47(6): 696

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    Paper Information

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    Received: Mar. 14, 2024

    Accepted: Jul. 3, 2025

    Published Online: Jul. 3, 2025

    The Author Email: ZHANG Xueming (optzhang@163.com)

    DOI:

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