Acceptable Error of Etching Depth in Ion Beam Etching Microlens

Acta Optica Sinica, Volume. 19, Issue 1, 113(1999)

[in Chinese]¹, [in Chinese]², and [in Chinese]²

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¹[in Chinese]

²[in Chinese]

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[in Chinese], [in Chinese], [in Chinese]. Acceptable Error of Etching Depth in Ion Beam Etching Microlens[J]. Acta Optica Sinica, 1999, 19(1): 113

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Paper Information

Category: Optical Devices

Received: Apr. 24, 1998

Accepted: --

Published Online: Aug. 9, 2006

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