Modified porous silica antireflective coatings with laser damage resistance for Ti:sapphire

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Collection Of theses on high power laser and plasma physics, Volume. 3, Issue 1, 244(2005)

[in Chinese]^*, [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800

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References(8)

[1] [1] W. H. Lowdermilk and D. Milam, Appl. Phys. Lett. 36, 891 (1980).

[2] [2] I. M.Thomas, Appl. Opt. 25, 1481 (1986).

[3] [3] W. Q. Zhang, C. S. Zhu, Q. X. Zhang, and F. Y. Guan, Chin. J. Lasers (in Chinese) 20, 916 (1993).

[4] [4] W. Q. Zhang, Y. X. Tang, X. L. Liu, and M. H. Jiang, Proc. SPIE 3175, 94 (1997).

[5] [5] P. F. Belleville, H. G. Floch, Proc. SPIE 2288, 25 (1994).

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[8] [8] P. Innocenzi, J. Non-Cryst. Solids 316, 309 (2003).

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Modified porous silica antireflective coatings with laser damage resistance for Ti:sapphire[J]. Collection Of theses on high power laser and plasma physics, 2005, 3(1): 244

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Paper Information

Category:

Received: Aug. 9, 2004

Accepted: --

Published Online: Jun. 1, 2007

The Author Email: (filmsolgel@mail.siom.ac.cn)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology