Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Chinese Journal of Lasers, Volume. 33, Issue suppl, 196(2006)

Parameter Change Law of the Polishing Powder and Its Influence on the Polishing Effect During the Optical Manufacture

[in Chinese]1,2、*, [in Chinese]2, [in Chinese]2, [in Chinese]2, [in Chinese]1, [in Chinese]1, and [in Chinese]1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (1)
    Tools
    Paper Information
    Topics
    References(1)

    [7] [7] M. J. Cumbo, D. Fairhurst, S. D. Jacobs et al.. Slurry particle size evolution during the polishing of optical glass [J]. Appl. Opt., 1995, 34(19): 3743～3755

    CLP Journals

    [1] Zhang Baoan, Bao Lei, Zhu Jianqiang. Influence of Slurry Particle Size on Materials Removal Rate and Roughness in High Power Laser Glass Material Polishing[J]. Acta Optica Sinica, 2009, 29(7): 1905

    Tools

    Get Citation

    Copy Citation Text

    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Parameter Change Law of the Polishing Powder and Its Influence on the Polishing Effect During the Optical Manufacture[J]. Chinese Journal of Lasers, 2006, 33(suppl): 196

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category:

    Received: --

    Accepted: --

    Published Online: Apr. 21, 2006

    The Author Email: (hjh_scu@163.com)

    DOI:

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology