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Chinese Optics Letters, Volume. 7, Issue 4, 04332(2009)

Fabrication of nc-Si/SiO2 structure by thermal oxidation method and its luminescence characteristics

Haojie Zhang, Longzhi Lin, and Shaoji Jiang
Author Affiliations
  • State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Guangzhou 510275E-mail: stsjsj@mail.sysu.edu.cn
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    Haojie Zhang, Longzhi Lin, Shaoji Jiang, "Fabrication of nc-Si/SiO2 structure by thermal oxidation method and its luminescence characteristics," Chin. Opt. Lett. 7, 04332 (2009)

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    Paper Information

    Received: Sep. 12, 2008

    Accepted: --

    Published Online: Apr. 27, 2009

    The Author Email:

    DOI:10.3788/COL20090704.0332

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology