Opto-Electronic Engineering, Volume. 48, Issue 9, 210167(2021)

Source optimization based on adaptive nonlinear particle swarm method in lithography

Wang Jian1,2, Liu Junbo1, and Hu Song1,2、*
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    Wang Jian, Liu Junbo, Hu Song. Source optimization based on adaptive nonlinear particle swarm method in lithography[J]. Opto-Electronic Engineering, 2021, 48(9): 210167

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    Paper Information

    Category: Article

    Received: May. 21, 2021

    Accepted: --

    Published Online: Dec. 25, 2021

    The Author Email: Hu Song (husong@ioe.ac.cn)

    DOI:10.12086/oee.2021.210167

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