High Power Laser and Particle Beams, Volume. 37, Issue 3, 035010(2025)

Development of dual front-stage voltage fast pulsed power supply

Mingrui Li1,2, Xiaojun Wang1,2, Daqing Gao1,2、*, Jie Gao1,2, Jiqiang Li1, Kaiming Yan1, Yuqiang Zhang1, Mengyan Sun2, Anzhou Huo1, Zhengyu Wang1, and Xin Zhao1
Author Affiliations
  • 1Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China
  • 2School of Nuclear Science and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(12)
    Layout of HIAF accelerator
    Layout of ECR 45o and 90o magnets
    Output current and voltage diagram of fast switching power supply
    Schematic diagram of circuit and current loops
    Schematic diagram of low voltage loops and high voltage loop at switch point
    Schematic diagram of control system loop
    Rise and fall time of output current waveform
    Error of output current during 300 ms flat top time at 570 A
    Waveform of current without enough energy
    Waveform of current at 570 A/3 Hz
    • Table 1. Specifications of HIAF ECR 90° magnet power supply

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      Table 1. Specifications of HIAF ECR 90° magnet power supply

      maximum current/Arise time/msflat top time/msfall time/msflat top errorfrequency/HzDC output power/kWload resistance/load inductance/mH
      570<30100~900<30<±1×10−4<3<1648.813
    • Table 2. Comparative analysis of power supply parameters

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      Table 2. Comparative analysis of power supply parameters

      maximum current/Arise time/msflat top time/msfall time/msflat top errorfrequency/HzDC output power/kW
      design570<30100~900<30<±1×10−4<3<16
      test result57025.4100~20021.8<±9.26×10−51~3<15.8
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    Mingrui Li, Xiaojun Wang, Daqing Gao, Jie Gao, Jiqiang Li, Kaiming Yan, Yuqiang Zhang, Mengyan Sun, Anzhou Huo, Zhengyu Wang, Xin Zhao. Development of dual front-stage voltage fast pulsed power supply[J]. High Power Laser and Particle Beams, 2025, 37(3): 035010

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    Paper Information

    Category: Power Circuit Topology and Simulation Technology

    Received: Sep. 27, 2024

    Accepted: Feb. 1, 2025

    Published Online: Apr. 29, 2025

    The Author Email: Daqing Gao (gaodq@impcas.ac.cn)

    DOI:10.11884/HPLPB202537.240344

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