XingGuang-Extreme Laser Facility

Yaping Dai; Jingqin Su; Xiaofeng Wei; Yuchi Wu; Lanqin Liu; Ping Li; Wenyi Wang; Donghui Lin; Liangfu Guo; Yong Chen; Mingzhong Li; Xiaocheng Tian; Xiaoming Zeng; Yanlei Zuo; Kainan Zhou; Xiongwei Yan; Shukai He; Jun Dong

doi:10.3788/AOS202242.1714001

Acta Optica Sinica, Volume. 42, Issue 17, 1714001(2022)

XingGuang-Extreme Laser Facility

Yaping Dai^1,2, Jingqin Su^1,2, Xiaofeng Wei^1、*, Yuchi Wu^1,2, Lanqin Liu^1,2, Ping Li^1,2, Wenyi Wang^1,2, Donghui Lin^1,2, Liangfu Guo^1,2, Yong Chen^1,2, Mingzhong Li^1,2, Xiaocheng Tian^1,2, Xiaoming Zeng^1,2, Yanlei Zuo^1,2, Kainan Zhou^1,2, Xiongwei Yan^1,2, Shukai He^1,2, and Jun Dong^1,2

Author Affiliations

¹Zhongshan Photon Science, Zhongshan 528400, Guangdong, China

²Laser Fusion Research Center, China Academy of Engineering Physics, Mianyang 621900, Sichuan, China

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Figures & Tables(13)

Fig. 1. Design diagram of general technical scheme of XG-ELF

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Fig. 2. Overall layout of XG-ELF

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Fig. 3. Schematic diagram of three kinds of pulse generation in XG-ELF

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Fig. 4. Schematic diagram of femtosecond laser system in XG-ELF

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Fig. 5. Three-dimensional schematic diagram of 100 J@1 Hz pump laser system

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Fig. 6. Schematic diagram of amplifier in 100 J@1 Hz pump laser system

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Fig. 7. Schematic diagram of picosecond laser system in XG-ELF

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Fig. 8. Schematic diagram of nanosecond laser system in XG-ELF

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Fig. 9. Schematic diagram of extreme conditions experiment station in XG-ELF

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Fig. 10. Schematic diagram of extreme fields experiment station in XG-ELF

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Fig. 11. Schematic diagram of advanced radiation sources experiment station in XG-ELF

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Fig. 12. Schematic diagram of ultrafast dynamics experiment station in XG-ELF. (a) DXAS zone; (b) UED zone; (c) ultrafast optics zone

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Table 1. General technical indexes of XG-ELF

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Table 1. General technical indexes of XG-ELF

Device	Number of beams	Central wavelength /nm	Energy	Pulse width	Peak power /PW	Repetition frequency	Remark
$2 \times 10 P W$ femtosecond laser	2	910	300 J	30 fs	10	4 $h \cdot s h o t^{- 1}$	Power density： 10²²-10²³ $W \cdot c m^{- 2}$
Repetitive femtosecond laser	1	910	25 J	25 fs	1	1 Hz	Power density： $10^{21} W \cdot c m^{- 2}$
Picosecond laser	1	1053	$> 1 k J$	1-10 ps	1	4 $h \cdot s h o t^{- 1}$	Power density： $10^{20} W \cdot c m^{- 2}$
Nanosecond laser	1	351	10 kJ	3 ns		4 $h \cdot s h o t^{- 1}$	Temporal-shaping and focal spot condition

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Yaping Dai, Jingqin Su, Xiaofeng Wei, Yuchi Wu, Lanqin Liu, Ping Li, Wenyi Wang, Donghui Lin, Liangfu Guo, Yong Chen, Mingzhong Li, Xiaocheng Tian, Xiaoming Zeng, Yanlei Zuo, Kainan Zhou, Xiongwei Yan, Shukai He, Jun Dong. XingGuang-Extreme Laser Facility[J]. Acta Optica Sinica, 2022, 42(17): 1714001

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Paper Information

Category: Lasers and Laser Optics

Received: Apr. 24, 2022

Accepted: Jun. 20, 2022

Published Online: Sep. 16, 2022

The Author Email: Wei Xiaofeng (xfwei@caep.cn)

DOI:10.3788/AOS202242.1714001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology